Table of Contents
Table of Contents
Preface
List of Abbreviations
List of Important Symbols
Part 1. CVD Equipment, Process and Thin Film Methodology
Chapter 1 – Basic Thin Film Materials in Integrated Circuit Technology (pp. 3-14)
Chapter 2 – General Thin Film CVD Characterization (pp. 15-24)
Chapter 3 – Basic Flow CVD Reactor Designs and Process Methodology (pp. 25-44)
Chapter 4 – Pulsed CVD Tools and Process Methodology (pp. 45-62
Chapter 5 – Brief Review on CVD Thin Film Analysis Techniques (pp. 63-76)
Chapter 6 – Methodology of Thin Film CVD Kinetic Studies (pp. 77-92)
Part 2. Examples of Thin Film Growth Kinetics Studies
Chapter 7 – Semiconductor Thin Film CVD: Polysilicon (pp. 95-110)
Chapter 8 – Dielectric Thin Film CVD: Silicon Nitride (pp. 111-134)
Chapter 9 – Dielectric Thin Film CVD: Silicon Dioxide (pp. 135-154)
Chapter 10 – Dielectric Thin Film CVD: Silicate Glasses (pp. 155-176)
Chapter 11 – Conductive Thin Film CVD: Ruthenium Metal (pp. 177-200)
Part 3. Thin Film CVD Process Features
Chapter 12 – Basic Aerosol Formation Effects at CVD (pp. 203-220)
Chapter 13 – Thin Film Process Classification and Schemes (pp. 221-230)
Chapter 14 – Thin Film Step Coverage and Gap-Fill (pp. 231-260)
Chapter 15 – Brief Overview on Interrelation of Thin Film CVD, Composition, Structure and Properties (pp. 261-276)
Chapter 16 – Summary and Future Trends (pp. 277-290)
Conclusion
Acknowledgments
Author Biography
Index