Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications


Juergen Geiser and Meraa Arab
Humboldt University of Berlin, Berlin, Germany

Series: Materials Science and Technologies
BISAC: TEC021000

This book discusses the study of simulating the growth of a thin film by chemical vapor deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models. (Imprint: Nova)

Table of Contents

Table of Contents


1. Introduction

2. Modeling

3. Mathematical Methods

4. Numerical Experiments

5. Conclusion




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