Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications


Juergen Geiser and Meraa Arab
Humboldt University of Berlin, Berlin, Germany

Series: Materials Science and Technologies
BISAC: TEC021000

This book discusses the study of simulating the growth of a thin film by chemical vapor deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models. (Imprint: Nova)

Table of Contents

Table of Contents


1. Introduction

2. Modeling

3. Mathematical Methods

4. Numerical Experiments

5. Conclusion




Publish with Nova Science Publishers

We publish over 800 titles annually by leading researchers from around the world. Submit a Book Proposal Now!