Table of Contents

ABSTRACT

The films of micro and nano dimensions are finding wide applications in engineering and science. The two well-known thin-film deposition methods—Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD) are briefly introduced in this short review. Focus is kept on magnetron sputtering that is one of the promising techniques coming under various PVD methods. Magnetron sputtering is utilised in many engineering applications to create thin coatings on different substrates. Employing this technique to deposit anti-reflective, hydrophobic/hydrophilic coatings on Solar photovoltaic (PV) panels can enhance their performance. The article includes the evolution and phases of development of magnetron sputtering techniques in chronological order. Also, the fundamental science underlying the sputtering process has been described. The classification, applications, and merits of the magnetron sputtering technique have been discussed along with the influence of significant process parameters such as the strength of the magnetic field, sputtering power, time, substrate temperature, etc. The method of deposition and the process parameters are very crucial in obtaining the desired characteristics in the deposited thin film. Fundamental aspects of DC magnetron sputtering, Reactive DC magnetron sputtering, and Radio Frequency magnetron sputtering have been examined and presented.

Keywords: thin-films, magnetron sputtering, physical vapour deposition, solar energy