Table of Contents
Table of Contents
Preface
Chapter 1. Ion Implantation in the Technology of Metal-Oxide Memristive Devices
(D. I. Tetelbaum, A. N. Mikhaylov, A. I. Belov, D. S. Korolev, E. V. Okulich, V. I. Okulich, R. A. Shuisky, D. V. Guseinov, E.G. Gryaznov and O. N. Gorshkov, Research Institute of Physics and Technology, Lobachevsky University, Nizhny Novgorod, Russia)
Chapter 2. Ion Implantation Technology in HgCdTe Epilayers
(Changzhi Shi, Chun Lin and Yanfeng Wei, Research Center for Advanced Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, China)
Chapter 3. Characterization of Low-Energy Ag+-Ion Implanted Silicon by Optical Reflection Spectra
(A.L. Stepanov, V.V. Vorobev, V.I. Nuzhdin, V.F. Valeev, A.M. Rogov and Y.N. Osin, Nanooptics and Nanoplasmonics Dept., Kazan Physical-Technical Institute, Russian Academy of Sciences, Kazan, Russia, and others)
Chapter 4. The Practical Application of Ion Implantation
(B. P. Gritsenko, A. Yu. Popov and D. S. Rechenko, Institute of Strength Physics and Materials SB RAS, Tomsk, Russia, and others)
Chapter 5. Ion Implantation of Titanium Alloys: Microstructure, Properties and Applications
(A. D. Pogrebnjak, V. M. Beresnev, S. N. Bratushka and A. P. Shypylenko, Department of Nanoelectronics, Sumy State University, Sumy, Ukraine, and others)
Chapter 6. Influence of Implantation of High Doses of Ions on Microstructure, Physical-Mechanical and Tribological Properties of Nanostructured Multielement Nitride Coatings
(A. D. Pogrebnjak and O. V. Bondar, Sumy State University, Sumy, Ukraine, and others)
Index