Table of Contents

Table of Contents

Preface

Chapter 1 – A Review on Hafnium: Synthesis, Properties and Applications of Variety of Hafnium Compounds (pp. 1-20)
Munusamy Thirumavalavan and Jiunn-Fwu Lee (Graduate Institute of Environmental Engineering, National Central University, Chung-Li, Taoyuan County, Taiwan)

Chapter 2 – Mechanical Engineering of Hafnium with Metal Transition Multilayers (pp. 21-50)
Cesar Escobar, Julio C. Caicedo and William Aperador (Thin-Film Group, Universidad del Valle – Cali; Tribology Polymers, Powder Metallurgy and Processing of Solid Recycled Research Group Universidad del Valle, Cali, and Facultad de Ingeniería, Universidad Militar Nueva Granda, Bogotá, Colombia)

Chapter 3 – Hafnium Carbide Coating: Properties of Bulk, Surface and Metal/HfC Interfaces (pp. 51-76)
H. Si Abdelkader and H. I. Faraoun (Division Etude et Prédiction des Matériaux, Unité de Recherche Matériaux et Energies Renouvelables.
LEPM-URMER. Université de Tlemcen – Algérie)

Chapter 4 – Stabilization of Higher Symmetry HfO2 Polymorphs As Thin Films and Nanoparticles (pp. 77-112)
Protima Rauwel and Erwan Rauwel (Dpt. of Physics, University of Tartu, Tartu, and Tartu College, Tallinn University of Technology, Tartu, Estonia)

Chapter 5 – Hafnium-Based Thin Oxides: Versatile Insulators for Microelectronics (pp. 113-136)
Albin Bayerl and Mario Lanza (Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, P. R. China)

Chapter 6 – Ultrathin Hafnium-Based High-K Dielectrics for High-K-Last / Gate-Last CMOS Integration Scheme (pp. 137-152)
Shu Xiang Zhang, Jiang Yan and HongYu Yu (Institute of Microelectronics of Chinese Academy of Sciences; Beitucheng West Road, ChaoYang District, Beijing, and South University of Science and Technology of China, 1088 Xueyuan Blvd, Nanshan District, Shenzhen, Guangdong, China)

Index