Chemical Vapor Deposition (CVD): Types, Uses and Selected Research

Monica Powell (Editor)

Series: Chemistry Research and Applications
BISAC: SCI013000

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This book provides new research on types and uses of chemical vapor deposition (CVD). Chapter One focuses on the synthesis and characteristics of carbon nanofibers based on phenolic resin and transition metal catalysts by CVD. Chapter Two provides an overview of different reactor types that have been proved to be viable options for graphene growth. Chapter Three outlines the significance of atmospheric pressure chemical vapor deposition technology in large area graphene electrodes and demonstrates their use in lithium ion batteries towards the advancement of their performance. Chapter Four analyzes low-energy plasma CVD for epitaxy and in-situ doping of group-IV semiconductors in nanoelectronics. (Imprint: Novinka)

Preface

Chapter 1. Synthesis and Characteristics of Carbon Nanofibers Based on Phenolic Resin and Transition Metal Catalysts by Chemical Vapor Deposition
Chang-Seop Lee and Yura Hyun (Department of Chemistry, Keimyung University, Daegu, South Korea)

Chapter 2. Conductive Thin Film CVD: Graphene
Steven Gottlieb, Nicolas Wöhrl and Volker Buck (Instituto de Microlelectrónica de Barcelona, Bellaterra, Spain, and others)

Chapter 3. Advances of APCVD Graphene-Based Electrodes for Li-Ion Batteries
Charalampos Drosos and Dimitra Vernardou (Department of Chemistry, University College London, London, UK, and others)

Chapter 4. Low-Energy Plasma CVD for Epitaxy and In-Situ Doping of Group-IV Semiconductors in Nanoelectronics
Masao Sakuraba, Hisanao Akima and Shigeo Sato (Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai, Japan)

Index

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