Table of Contents
Preface
Chapter 1. CVD Technologies and Basic Properties of SiNH-Contained Thin Films for Applications in Electronic Devices
(Vladislav Yu. Vasilyev – Semiconductors and Microelectronics Department, Faculty of Radio Engineering and Electronics, Novosibirsk State Technical University, Novosibirsk, Russia)
Chapter 2. Rapid-Heating Criterion in CVD Diamond Growth Technology and Possibility of Synthesizing Large Diamonds without High Pressure and Prepared Substrate
(Nickolay I. Alekseyev, Anton P. Broyko, Vladislav S. Khadutin, Ivan K. Khmelnitsky and Ivan V. Oreshko – Department of Micro and Nanoelectronics, Saint Petersburg Electrotechnical University “LETI,” St. Petersburg, Russia)
Chapter 3. Graphene Preparation by Chemical Vapour Deposition Method and its Basic Parameters
(P. Machac – Department of Solid State Engineering, University of Chemistry and Technology, Prague, Czech Republic)
Index